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New material has great potential

From left, U.S. Air Force Academy Cadet First Class Hayley Weir and AFCEC research chemist Katherine Simpson talk about Weir's capstone project; the development of a new ballistic resistant, flexible, lightweight nanotech-enabled fabric. The material, which is patent pending, could be applied as a protective lining on a variety of objects ranging from body armor to tents and vehicles. (U.S. Air Force photo/Mekka Parish)

PHOTO BY: Mekka Parish
VIRIN: 170501-F-HC948-001.JPG
FULL SIZE: 0.92 MB
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No camera details available.

IMAGE IS PUBLIC DOMAIN

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This photograph is considered public domain and has been cleared for release. If you would like to republish please give the photographer appropriate credit. Further, any commercial or non-commercial use of this photograph or any other DoD image must be made in compliance with guidance found at https://www.dimoc.mil/resources/limitations, which pertains to intellectual property restrictions (e.g., copyright and trademark, including the use of official emblems, insignia, names and slogans), warnings regarding use of images of identifiable personnel, appearance of endorsement, and related matters.


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New material has great potential

From left, U.S. Air Force Academy Cadet First Class Hayley Weir and AFCEC research chemist Katherine Simpson talk about Weir's capstone project; the development of a new ballistic resistant, flexible, lightweight nanotech-enabled fabric. The material, which is patent pending, could be applied as a protective lining on a variety of objects ranging from body armor to tents and vehicles. (U.S. Air Force photo/Mekka Parish)

PHOTO BY: Mekka Parish
VIRIN: 170501-F-HC948-001.JPG
FULL SIZE: 0.92 MB
Additional Details

No camera details available.

IMAGE IS PUBLIC DOMAIN

Read More

This photograph is considered public domain and has been cleared for release. If you would like to republish please give the photographer appropriate credit. Further, any commercial or non-commercial use of this photograph or any other DoD image must be made in compliance with guidance found at https://www.dimoc.mil/resources/limitations, which pertains to intellectual property restrictions (e.g., copyright and trademark, including the use of official emblems, insignia, names and slogans), warnings regarding use of images of identifiable personnel, appearance of endorsement, and related matters.